Multilayer thin-film polarizer design for the far ultraviolet using the induced transmission and absorption technique

Details Multilayer thin-film polarizer design for the far ultraviolet using the induced transmission and absorption technique Multilayer thin-film polarizer design for the far ultraviolet using the induced transmission and absorption technique

Nov 1994

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1994spie.2283..142k&link_type=abstract

Proc. SPIE Vol. 2283, p. 142-149, X-Ray and Ultraviolet Spectroscopy and Polarimetry, Silvano Fineschi; Ed.

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Scientific paper

Good theoretical designs of far ultraviolet polarizers have been reported using a MgF(subscript 2)/Al/MgF(subscript 2) three layer structure on a thick Al layer as a substrate. The thicknesses were determined to induce transmission and absorption of p-polarized light. In these designs Al optical constants were used from films produced in ultrahigh vacuum (UHV:10(superscript -10) torr). Reflectance values for polarizers fabricated in a conventional high vacuum (p approximately 10(superscript -6) torr) using the UHV design parameters differed dramatically from the design predictions. Al is a highly reactive material and is oxidized even in a high vacuum chamber. In order to solve the problem other metals have been studied. It is found that a larger reflectance difference is closely related to higher amplitude and larger phase difference of Fresnel reflection coefficients between two polarizations at the boundary of MgF(subscript 2)/metal. It is also found that for one material a larger angle of incidence from the surface normal brings larger amplitude and phase difference. Be and Mo are found good materials to replace Al. Polarizers designed for 121.6 nm with Be at 60 degree(s) and with Mo at 70 degree(s) are shown as examples.

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