Microscopic and macroscopic modeling of layer growth kinetics and morphology in vapor deposition processing

Statistics – Applications

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Vapor Phase Epitaxy, Growth From Vapor Phase, Growth In Microgravity Environments

Scientific paper

A combined micro-macro modeling capability is being developed for simulation of the vapor growth of semiconductors for the electronics and optical electronics industry. The micro modeling is on the atomic scale and uses a Monte Carlo method to predict the surface growth rate, morphology and composition. In parallel, the composition and thermal conditions near the growth interface are predicted with a macro-scale flow, heat and multi component mass transport model which includes gas phase reaction and surface chemistry. The effects of gravity driven convection on the macro-scale transport are being investigated in a related NASA microgravity study for a range of Grashof and Reynolds numbers. The overall objective is to better understand and control the parameters influencing the quality of the materials being processed.

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