Computer Science
Scientific paper
Sep 2003
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2003esasp.540..497d&link_type=abstract
In: Proceedings of the 9th International Symposium on Materials in a Space Environment, 16-20 June 2003, Noordwijk, The Netherla
Computer Science
Space Environment, Materials
Scientific paper
The new method for investigation of the formation of gaseous products under action the thermal atomic oxygen (AO) to the polyethylene (PE) was developed. The AO was obtained by photodissociation of molecular oxygen O2(3Σ-g) (the pressure 0.04 - 0.3 kPa) under action the monochromatic light with wavelength 147nm of xenon resonance lamp with intensity of about 1014 - 1015 photon/s. The etching of PE films was conducted in closed volume and at constant velocity etching. The main gaseous products are carbon dioxide, carbon monoxide, water, and hydrogen. The such simple set of gaseous products indicate, that take place the atom by atom 'stripping' of macromolecules in process of etching. The reduction of quantum yield Φ(CO2, CO, H2O, H2) is linear as the pressure of oxygen is reduced. The linear extrapolation of that relationship to zero pressure produces Φ(CO2, CO, H2O, H2) = (0.62±0.1) which defines the action only AO. The conversion of that value to reaction efficiency of etching produce 3.25×10-24 cm3/atom O , which is fitted well with literature data. One may believe, that under action of thermal and fast AO the chemical mechanism of etching of PE is similar in basic reactions.
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