Illumination optics design for EUV lithography

Details Illumination optics design for EUV lithography Illumination optics design for EUV lithography

Nov 2000

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000spie.4146...25a&link_type=abstract

Proc. SPIE Vol. 4146, p. 25-34, Soft X-Ray and EUV Imaging Systems, Winfried M. Kaiser; Richard H. Stulen; Eds.

Computer Science

3

Scientific paper

In this paper, a comparison of two different solutions for the illuminator is presented. The systems are intended to comply with the illumination requirements, but have different advantages and drawbacks. The examples represent solutions based on conical reflection and on a fly's-eye integrator. A comparison is given and the potentials of the different solutions are outlined.

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