Computer Science – Performance
Scientific paper
Dec 2002
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2002spie.4795..146n&link_type=abstract
Materials for Infrared Detectors II. Edited by Longshore, Randolph E.; Sivananthan, Sivalingam. Proceedings of the SPIE, Volume
Computer Science
Performance
Scientific paper
Reactive ion etching (RIE) is known to type convert p-type HgCdTe to n-type, thus providing a method for p-n junction formation for photodiode fabrication. Mid-wavelength infrared (MWIR) n-on-p photodiodes fabricated using RIE induced p-to-n type conversion have already been demonstrated and show excellent performance. This paper will report on the successful application of RIE junction formation technology for long-wavelength infrared (LWIR) HgCdTe photodiodes, and compares the device performance of photodiodes fabricated on vacancy and extrinsically doped p-type HgCdTe. The diode current versus bias voltage (I-V) characteristic of these devices have also been measured as a function of temperature in the range 20K to 200K with various junction areas. These results are compared in the light of detailed Hall measurement data obtained from type converted materials.
Antoszewski Jarek
Dell John M.
Faraone Lorenzo
Musca Charles A.
Nguyen Toan Thang
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