Fabrication of sub-micron gratings in ultrathin films by 157-nm laser ablation and their application as grating waveguide structures

Details Fabrication of sub-micron gratings in ultrathin films by 157-nm laser ablation and their application as grating waveguide structures Fabrication of sub-micron gratings in ultrathin films by 157-nm laser ablation and their application as grating waveguide structures

Oct 2004

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2004spie.5578..559b&link_type=abstract

Photonics North 2004: Optical Components and Devices. Edited by Armitage, John C.; Fafard, Simon; Lessard, Roger A.; Lampropoul

Computer Science

Scientific paper

Submicron surface-relief gratings were fabricated in ultrathin dielectric films by F2-laser ablation. Projection mask imaging by a Schwarzschild objective lens applying nanosecond duration pulses from a high-resolution 157-nm optical processing system generated 780-nm-period gratings in various thin metal oxide layers. The grating modulation depths were controllable in the range of ~5 to ~50 nanometers by applying appropriate energy densities and numbers of laser pulses. Surface characterization of the gratings shows laser ablation to be a promising alternative approach to well-known lithographic methods for the fabrication of submicron-period gratings in thin films. Grating waveguide structures (GWS), comprising of a substrate, a thin waveguide, and a laser-formed surface grating, were examined under resonance to serve ideally as high reflection mirrors with no absorption loss. Resonant reflection and transmission spectra demonstrate efficient waveguide coupling for ultrashort titanium-sapphire laser pulses near 800 nm. The potential application of such grating waveguides as narrow-band spectral filters, optical switches and modulators, high reflectivity mirrors, or biosensor chips is shown and discussed.

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