Computer Science – Performance
Scientific paper
Feb 1991
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1991spie.1343..428b&link_type=abstract
IN: X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego,
Computer Science
Performance
Diffraction Patterns, Fabrication, Holography, Mirrors, Photolithography, Plasma Etching, Molybdenum, Optical Materials, Optical Properties, Performance Tests, Silicon
Scientific paper
The fabrication of a multilayer linear grating, characterization in the soft X-ray region, and modeling of its performance are reported. Holographic lithography was used to produce a 0.24-micron spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu L-alpha-beta line (1.33 nm). The results are compared to the values calculated within the framework of a scalar kinematic diffraction theory of relief gratings.
André Jean-Michel
Barchewitz R.
Berrouane H.
Ladan F.-R.
Lepetre Yves
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