Extreme-ultraviolet source development: a comparison of different concepts

Details Extreme-ultraviolet source development: a comparison of different concepts Extreme-ultraviolet source development: a comparison of different concepts

Nov 2000

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000spie.4146..113s&link_type=abstract

Proc. SPIE Vol. 4146, p. 113-120, Soft X-Ray and EUV Imaging Systems, Winfried M. Kaiser; Richard H. Stulen; Eds.

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We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik. Friedrich- Schiller Universitat Jena, Max-Born Institut Berlin, and Gustav August Universitat Gottingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

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