Emerging-flux fitting method for inverse scattering problems.

Computer Science

Scientific paper

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Scientific paper

An emerging-flux fitting (EFF) method for inverse scattering problems is proposed and the adequacy of the EFF method is examined through several numerical simulations. The proposed method has been used to estimate the albedo and the Henyey-Greenstein phase function of a scattering medium so that the calculated emerging fluxes at the outer boundaries of a medium are close to the observed values. Results of the numerical simulations based on the present algorithm are compared with those based on the emerging-intensity fitting method. It is found that both procedures yield almost the same results as long as the optical thickness of a medium is not less than unity.

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