Electrical characterization of AlxGa1-xN for UV photodetector applications

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Scientific paper

Ultraviolet photodetectors have many military and commercial applications. However, for many of these applications, the photodetectors must be solar blind. This means that the photodetectors must have a cutoff wavelength of less than about 270 nm. Semiconductor based devices would then need energy gaps of over 4.6 eV. In the Al(subscript x)Ga(subscript 1-x)N system, the aluminum mole fraction, x, required is over 40%. As the energy gap is increased, doping becomes much more difficult, especially p-type doping. This report is a study of the electrical properties of Al(subscript x)Ga(subscript 1-x)N to enable better control of the doping. Magnesium doped p-type Al(subscript x)Ga(subscript 1- x)N has been studied using high-temperature Hall effect measurements. The acceptor ionization energy has been found to increase substantially with the aluminum content. Short-period superlattices consisting of alternating layers of GaN:Mg and AlGaN:Mg were also grown by low-pressure organometallic vapor phase epitaxy. The electrical properties of these superlattices were measured as a function of temperature and compared to conventional AlGaN:Mg layers. It is shown that the optical absorption edge can be shifted to shorter wavelengths while lowering the acceptor ionization energy by using short- period superlattice structures instead of bulk-like AlGaN:Mg. Silicon doped n-type films have also been studied.

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