Computer Science
Scientific paper
Jun 2010
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2010aipc.1242..109l&link_type=abstract
PLASMAS IN THE LABORATORY AND THE UNIVERSE: Interactions, Patterns, and Turbulence. AIP Conference Proceedings, Volume 1242, pp
Computer Science
Plasma Interactions, Molecular Dynamics Method, Modulation, Cameras, Plasma-Material Interactions, Boundary Layer Effects, Molecular Dynamics Methods, Modulators And Demodulators, Discriminators, Comparators, Mixers, Limiters, And Compressors, Photography, Photographic Instruments, Xerography
Scientific paper
The dust contamination in plasma deposition processes plays a crucial role in the quality and the yield of the products. To improve the quality and the yield of plasma processing, a favorable way is to remove the dust particles actively from the plasma reactors.
Our recent experiments in the striped electrode device show that a traveling plasma modulation allows for a systematic particle removal independent of the reactor size. Besides the rf powered electrode, the striped electrode device includes a segmented electrode that consists of 100 electrically insulated narrow stripes. A traveling potential profile is produced by the modulation of the voltage signals applied on the stripes. The dust particles are trapped in the potential wells and transported with the traveling of the potential profile.
The particle-in-cell (PIC) simulation on the potential above the segmented electrode indicates that the traveling potential profile can be realized either by applying low-frequency (0.1-10 Hz) voltage signals with a fixed phase shift between adjacent stripes or high-frequency (10 kHz âĂŞ 100 MHz) signals with the amplitudes modulated by a low-frequency envelope. The transportation of the dust particles is simulated with a two-dimensional molecular dynamics (MD) code with the potential profile obtained from the PIC simulation. The MD results reproduce the experimental observations sucessfully.
This technology allows for an active removal of the contaminating particles in processing plasmas and it is independent of the reactor size. The removal velocity is controllable by adjusting the parameters for the modulation.
Jiang Ke
Li Yang-Fang
Morfill Gregor E.
Thomas Hubertus M.
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