Charge transfer approach to negative resists

Details Charge transfer approach to negative resists Charge transfer approach to negative resists

Jun 1992

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1992spie.1672..611b&link_type=abstract

Proc. SPIE Vol. 1672, p. 611-615, Advances in Resist Technology and Processing IX, Anthony E. Novembre; Ed.

Computer Science

Scientific paper

Three-dimensional lithographic patterns can be obtained using a new two component UV sensitive polymer system. The light-sensitive material consists of a chlorine containing conventional polymer, i.e., poly(chloroacrylonitrile) as a typical acceptor, and a heterocyclic or aromatic monomer as the donor, here pyrrole. This two component precomposite can be irradiated by either an excimer laser or the radiation of a high pressure mercury lamp. The resulting image, essentially a black and white pattern, can be developed in wet or dry (ion etching, ablation) modes giving resist patterns with a resolution in the micrometer range.

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