Mathematics
Scientific paper
Oct 1990
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1990rpsct........4v&link_type=abstract
In its JPRS Report: Science and Technology. USSR: Physics and Mathematics p 4-5 (SEE N91-19800 11-70) Transl. into ENGLISH from
Mathematics
Emission Spectra, Excimer Lasers, Gratings (Spectra), Line Spectra, Photolithography, Wave Diffraction, Xenon Chloride Lasers, Diffraction Patterns, Grazing Incidence, Telescopes
Scientific paper
Narrowing the emission line of excimer lasers for ultraviolet photolithography with use of monochromatic objectives is considered as an alternative to the costly manufacturing of polychromatic precision objectives or wide-aperature wide-field mirrors of chromatic aberration. Experiments were performed with an ELI-71 commercial 308 nm XeCl-laser and with a diffraction grating as a dispersive element. The latter was either a reflective one with 2400 lines/mm in an autocollimating position at a 22 degree angle of reflection in the first order, preceded by a beam-widening tetraprism telescope, or a diffraction grating with 2400 lines/mm in a position for grazing incidence at a 5 to 10 degree angle and for the high-reflectance to be located with in the first order of the diffraction pattern. The results of this investigation are presented.
Valiyev K. A.
Velikov L. V.
Volkov G. S.
Zaroslov Yu. D.
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