Boron carbon nitride materials for tribological and high temperature device applications

Details Boron carbon nitride materials for tribological and high temperature device applications Boron carbon nitride materials for tribological and high temperature device applications

Jan 1998

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1998aipc..420..666b&link_type=abstract

Space technology and applications international forum - 1998. AIP Conference Proceedings, Volume 420, pp. 666-671 (1998).

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Ceramics And Refractories, Ion And Electron Beam-Assisted Deposition, Ion Plating

Scientific paper

We have used ion (or neutral) and electron cyclotron resonance assisted physical vapor deposition to produce high quality BN/CN thin films on Si and sapphire substrates. We have already demonstrated deposition of films containing a high fraction of the metastable c-BN phase as determined by FTIR spectroscopy and transmission electron microscopy (TEM). Atomic force microscopy (AFM) measurements have shown our films to have an excellent rms roughness ~10.5 Å (which is better than the best CVD diamond thin films). Results from frictional force microscopy (FFM) from BN and BCN films show a direct correlation with surface N content. Preliminary results show friction properties superior to that of TiN (the standard in the thin film coatings industry). Hardness measurements on the same films yielded Knoop hardness (KH) values of ~3350 kg/mm2, close to that of ceramic c-BN (3500 kg/mm2). In this paper we will present our results on the synthesis of these materials and discuss their hardness and tribological properties. Finally, BN and CN samples have been subjected to laser experiments and preliminary results are encouraging as far as the application of these materials to high temperature, high power optoelectronic systems and solid state device fabrication.

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