Analysis for method of creating thin film masks of arbitrarily varying transmittance

Details Analysis for method of creating thin film masks of arbitrarily varying transmittance Analysis for method of creating thin film masks of arbitrarily varying transmittance

Jul 2006

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2006spie.6273e..61b&link_type=abstract

Optomechanical Technologies for Astronomy. Edited by Atad-Ettedgui, Eli; Antebi, Joseph; Lemke, Dietrich. Proceedings of the S

Astronomy and Astrophysics

Astronomy

Scientific paper

A new technique for creating optical masks with a transmittance that varies spatially according to an arbitrary usersupplied equation is discussed. Initial fabrication and testing demonstrates the viability of the technique, as well as showing the effect of various deposition parameters in the resulting product. The test data are compared to both simulated and ideal results. The application of this technique to the creation of a coronagraphic filter with strong central attenuation and minimal edge diffraction is also discussed.

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