A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE optical surfaces

Details A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE optical surfaces A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE optical surfaces

Jul 2006

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2006spie.6273e...9f&link_type=abstract

Optomechanical Technologies for Astronomy. Edited by Atad-Ettedgui, Eli; Antebi, Joseph; Lemke, Dietrich. Proceedings of the S

Astronomy and Astrophysics

Astronomy

1

Scientific paper

The next generation of 30-100 metre diameter extremely large telescopes (ELTs) requires large numbers of hexagonal primary mirror segments. As part of the Basic Technology programme run jointly by UCL and Cranfield University, a reactive atomic plasma technology (RAP(tm)) emerged from the US Lawrence Livermore National Laboratory (LLNL), is employed for the finishing of these surfaces. Results are presented on this novel etching technology. The Inductively Coupled Plasma (ICP) operated at atmospheric pressure using argon, activates the chemical species injected through its centre and promotes the fluorine-based chemical reactions at the surface. Process assessment trials on Ultra Low Expansion (ULE(tm)) plates, previously ground at high material removal rates, have been conducted. The quality of the surfaces produced on these samples using the RAP process are discussed. Substantial volumetric material removal rates of up to 0.446(21) mm 3/s at the highest process speed (1,200 mm/min) were found to be possible without pre-heating the substrate. The influences of power transfer, process speed and gas concentration on the removal rates have been determined. The suitability of the RAP process for revealing and removing sub-surface damage induced by high removal rate grinding is discussed. The results on SiC samples are reported elsewhere in this conference.

Affiliated with

Also associated with

No associations

Rating

A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE optical surfaces does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE optical surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE optical surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1893246