Systematic investigation of the growth of LaNiO3/PZT/LaNiO3/Si and LaNiO3/PZT/LaNiO3/polymer/Si for IR detector applications

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We have been focused on growth of multi-layered LaNiO3/Pb(Zr,Ti)O3/LaNiO3 on bare Si and polymer-coated Si substrates for infrared detector applications. A unique ion-beam assisted pulsed laser deposition (IBAD-PLD) has been employed to address two critical issues related to these thin film ferroelectric (TFFE) devices: to reduce the thermal budget and to enhance the texture of the devices. IBAD has been a well-known technique for deposition of thin films due to the ability to control morphology, adhesion, texture, and stoichiometry of the film by providing extra kinetic energies to, and to generate desired textures in films by preferential sputtering of the growing surface of the film. We have studied the role of several processing parameters of IBAD-PLD process, including ion-beam energy, current density, IBAD time, and substrate temperature in order to identify the best processing window for LaNiO3/Pb(Zr,Ti)O3/LaNiO3.

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