Electron Energy Deposition in a Gas Mixture of Atomic and Molecular Hydrogen and Helium

Details Electron Energy Deposition in a Gas Mixture of Atomic and Molecular Hydrogen and Helium Electron Energy Deposition in a Gas Mixture of Atomic and Molecular Hydrogen and Helium

Nov 1999

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1999apjs..125..237d&link_type=abstract

The Astrophysical Journal Supplement Series, Volume 125, Issue 1, pp. 237-256.

Astronomy and Astrophysics

Astronomy

68

Atomic Processes, Ism: Abundances, Ism: Molecules, X-Rays: General

Scientific paper

A detailed discussion is presented of the slowing down of fast electrons in a partly ionized gas mixture of H, H2, and He with a varying ratio of H to H2 and a fixed fraction of He. The mean energies and yields for ionization, electronic excitation, dissociation, and vibrational excitation and the heating efficiencies are calculated for fractional ionizations from 0 to 0.1. Analytical formulas are obtained for many of the parameters.

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