Reflective optical designs for soft x-ray projection lithography

Details Reflective optical designs for soft x-ray projection lithography Reflective optical designs for soft x-ray projection lithography

Dec 1991

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1991spie.1527..163j&link_type=abstract

Proc. SPIE Vol. 1527, p. 163-173, Current Developments in Optical Design and Optical Engineering, Robert E. Fischer; Warren J. S

Computer Science

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Scientific paper

All-reflective, unobscured optical designs were developed to help identify a candidate first- generation system to be used in soft x-ray projection lithography. The resolution goal for all designs was 0.1 micrometers , or better, at a design wavelength of 13 nm. Different design aspects including usable field size, image distortion, number of mirrors, telecentricity, surface shape (spherical versus aspheric), and system packaging were explored. Trade-off studied between systems requiring scanning and full-format nonscanning systems were made. The tolerance sensitivity analysis for a representative design demonstrated that as-built performance will be driven by the mirror surface irregularity tolerance; the required tolerance levels are briefly discussed.

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