Silicon wafers for scanning helium microscopy

Details Silicon wafers for scanning helium microscopy Silicon wafers for scanning helium microscopy

Jan 2008

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2008spie.6937e.144l&link_type=abstract

Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2007. Edited by Romaniuk, Rys

Statistics

Applications

Scientific paper

The Scanning Helium Microscopy is a new technique currently under development. The paper is an overview of measurements of the geometrical characteristics of Silicon wafer concentrating on accuracy and closely related matters. In the microscope the helium atom beam is used as a probe. The overall microscope resolution depends on a deflecting element, which shapes the beam and focuses it onto a sample's surface. The most promising focusing component appears to be an ultra thin silicon wafer that is deformed under a precise electric field. Flatness and thickness uniformity of the wafer must be measured in order to select the best plate to be used in the microscope. A scanning measurement system consists of two coaxially positioned confocal heads. The paper discusses measures taken to overcome the system sensitivity to temperature variation and concludes with utilizing symmetry descriptors for final selection of wafers.

Affiliated with

Also associated with

No associations

Rating

Silicon wafers for scanning helium microscopy does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Silicon wafers for scanning helium microscopy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon wafers for scanning helium microscopy will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1258537