Interferometric Determination of Apparent Thickness of Coatings

Details Interferometric Determination of Apparent Thickness of Coatings Interferometric Determination of Apparent Thickness of Coatings

Feb 1947

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1947natur.159..228d&link_type=abstract

Nature, Volume 159, Issue 4033, pp. 228-229 (1947).

Computer Science

3

Scientific paper

THE thickness of deposit from an atomic beam is measured as follows. The film (X) is deposited on a high-grade flat through a grid-like mask of thin metal held in close contact. Then the mask is removed from the flat, and a highly reflective opaque coating (Y) is evaporated over the whole. The steps on the surface of the flat, which are the edges of X, appear in the surface of Y. A second flat with a highly reflective but slightly transparent coating (Z) is then brought close up, and the interferometer thus formed is examined by the reflected system of multiple beam precision fringes of equal thickness1. The accompanying reproduction, which was taken in a parallel beam of green light from a filtered mercury arc, shows the appearance of the fringes with a thickness of X = 569 A.

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