Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas

Details Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas

Dec 2000

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000spie.4139...59p&link_type=abstract

Proc. SPIE Vol. 4139, p. 59-69, Instrumentation for UV/EUV Astronomy and Solar Missions, Silvano Fineschi; Clarence M. Korendyke

Astronomy and Astrophysics

Astronomy

1

Scientific paper

The optical design of a stigmatic spectroscopic system for diagnostic of laser-produced plasmas in the 2.5 - 40 nm region is presented. The system consists of a grazing-incidence toroidal mirror which focuses the radiation emitted by a laser-produced plasma on the entrance slit of a spectrograph. The latter has a spherical variable-line-spaced grating with flat-field properties coupled to a spherical focusing mirror that compensates for the astigmatism. The mirror is crossed with respect to the grating, i.e. it is mounted with its tangential plane coincident with the equatorial plane of the grating. The spectrum is acquired by an EUV-enhanced CCD detector with high quantum efficiency. This stigmatic design has also spectral and spatial resolution capability for extended sources: the spectral resolution is independent from the size of the source while the spatial resolution decreases for sources far from the optical axis. The expected performances are presented and compared with those of a conventional stigmatic design with a plane variable-line- spaced grating.

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