Multilayer coatings for narrowband imaging in the extreme ultraviolet

Details Multilayer coatings for narrowband imaging in the extreme ultraviolet Multilayer coatings for narrowband imaging in the extreme ultraviolet

Oct 1997

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1997spie.3114..608l&link_type=abstract

Proc. SPIE Vol. 3114, p. 608-616, EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy VIII, Oswald H. Siegmund; Mark A. Gumm

Astronomy and Astrophysics

Astronomy

Scientific paper

Multilayer coatings for narrowband imaging in the extreme ultraviolet (EUV) have been designed and prepared. Multilayers were designed to optimize reflectivity at O(superscript +) 83.4 nm spectral line, and simultaneously to reject radiation at 121.6 nm Lyman (alpha) hydrogen line. Al/MgF(subscript 2)/Mo multilayer coatings were prepared and high reflection/suppression ratios at the above wavelengths were measured. The coatings also exhibited a dip in reflectivity at 102.6 nm Lyman (beta) . The coatings showed some slow degradation over time, but maintained a high reflection/suppression ratio after a few months. Sample cleaning was found effective in restoring a very low reflectivity at 121.6 nm for samples aged of over 100 days.

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