Trends in optical design of projection lenses for UV and EUV lithography

Details Trends in optical design of projection lenses for UV and EUV lithography Trends in optical design of projection lenses for UV and EUV lithography

Nov 2000

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000spie.4146...13u&link_type=abstract

Proc. SPIE Vol. 4146, p. 13-24, Soft X-Ray and EUV Imaging Systems, Winfried M. Kaiser; Richard H. Stulen; Eds.

Computer Science

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3

Scientific paper

The continuing trend towards higher integration density of microelectronic circuits requires steadily decreasing feature sizes. The SIA roadmap defines the technologies needed to meet this challenges. One of the fundamental requirements for lithography with a resolution of 100 nm and below is the development of new high-performance optical designs for projection lenses.

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