The direct measurement of the 3 3P0-3 3P1 fine-structure interval and the gJ-factor of atomic silicon by laser magnetic resonance

Details The direct measurement of the 3 3P0-3 3P1 fine-structure interval and the gJ-factor of atomic silicon by laser magnetic resonance The direct measurement of the 3 3P0-3 3P1 fine-structure interval and the gJ-factor of atomic silicon by laser magnetic resonance

Mar 1984

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1984apj...278l.127i&link_type=abstract

Astrophysical Journal, Part 2 - Letters to the Editor (ISSN 0004-637X), vol. 278, March 15, 1984, p. L127-L130. Research support

Astronomy and Astrophysics

Astrophysics

25

Atomic Spectra, Fine Structure, Laser Spectroscopy, Magnetic Resonance, Silicon, Atomic Energy Levels, Cosmochemistry, Far Infrared Radiation, Zeeman Effect

Scientific paper

Laser magnetic resonance measurements have been performed on the ground 3p2 3P multiplet of atomic silicon. The J = 1<-0 fine-structure interval and the g-factor of the 3P1 state have been determined with high precision. The results are: ΔE(3P1-3P0) = 2,311,755.6(7) MHz and gJ(3P1) = 1.500830(70). Single-configuration calculations of gJ(3P1) and gJ(3P2), with accurate Hartree-Fock wave functions, were performed.

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