4. Physics
  5. Condensed Matter
  6. Materials Science

Tangali Sudarshan

Physics – Condensed Matter – Materials Science

Scientist

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High growth rate 4H-SiC epitaxial growth using dichlorosilane in a hot-wall CVD reactor

Physics – Condensed Matter – Materials Science
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High purity semi-insulating 4H-SiC epitaxial layers by Defect-Competition Epitaxy

Physics – Condensed Matter – Materials Science
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Profile ID: LFWR-SCP-P-185579

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