Other
Scientist
Kungliga Tekniska Hogskolan, Stockholm, Sweden
Royal Institute of Technology, Stockholm, Sweden
Department of Plasma Physics, Alfven laboratory, Royal Institute of Technology
Current chopping space charge layers in a low pressure arc plasma
Potential drops supported by ion-density cavities in the dynamic response of a plasma diode to an applied field
Some dynamical properties of very strong double layers in a triple plasma device
Some dynamical properties of very strong double layers in a triple plasma device
Studies of anomalous potential drops due to ion density inhomogeneities
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